Ion Guns: Model 1420 – 20kV 20kev 离子枪

Ion Guns:  Model 1420 – 20kV 20kev 离子枪

Design Features

  • Adjustable spot size ≥ 5um for spatially defined sputtering or implantation
  • Emission regulated bombardment provides stable ion current
  • Continuously variable beam energy 5kV to 20kV
  • Dual octupole for beam scanning and astigmatism correction
  • Pre-objective scanning for reduced spot size
  • No direct filament to sample line of sight to avoid sample contamination
  • Customer replaceable filaments and beam trimming apertures
  • Dual filaments provide operational backup in case of filament end of life
  • All UHV compatible and etch resistant materials used in fabrication
  • Differential pumping to minimize main chamber gas load
  • Operates over the range of inert gases and Nitrogen

Performance @ 20kV, Ar Ions

 Mode Spot Size
(µm)
Beam CurrentCurrent Density
(A/cm2)
 Large Spot 4020 µA1.5
 Medium Spot155 µA2.8
 Small Spot8500 µA1.0